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2006 Photo Contest Winners

Congratulations to the 2006 winners!
 Category I: Color Images
1st Place:

Bill Morrow
MEFAS Inc, Lake Forest, California, USA

EOS damaged thin film resistor on a GaAs substrate.

2nd Place:


Ramesh Kuchibhatla

Semiconductor Insights, Kanata, Ontario, Canada

Optical Topographical view of a
laser end seen through the lens.
3rd Place: 

Vincent Liew

Micron Semi Asia, Singapore

Passivation delamination

 Category II: Black and White Images

1st Place:

Zachary Gemmill

National Semiconductor, Santa Clara, California, USA

“Hardened Artery.” FIB cross-section of a copper wire showing oxidation layers after thermal stress. (secondary electron image taken with the ion beam)

2nd Place: 

Choong Pin Joey Phua

AMD, Singapore

This shows transistors of an SOI device.
The chip is deprocessed from the
backside with bulk silicon, box and active silicon removed, revealing the
channel, nitride spacer and the COSI.
This is useful for salicide defect
inspection from the backside of the die.

 

3rd Place:

Sue Brown

Semiconductor Insights, Kanata, Ontario, Canada

SEM view of dendritic growth on surface of an IC
 Category III: False Color Images

1st Place:

Tsan-Cheng Chuang
Cha-Ming Shen
Jon C. Lee

TSMC, Tainan, Taiwan, ROC

SCM image (Scanning Capacitance Microscope) showed that P+ doping concentration/distribution abnormal was revealed at VDD node.

2nd Place:

 

 

Ramesh Kuchibhatla

Semiconductor Insights, Kanata, Ontario, Canada

Optical Image of a III-V, LaserDiode
created using Linear Local Level
Equilization Technique.

3rd Place:

Hadi Winata

Micron Semi Asia, Singapore

Backside Emmission